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    請使用永久網址來引用或連結此文件: http://chur.chu.edu.tw/handle/987654321/34666


    題名: Run by Run Process Control of Metal Sputter Deposition: Combining Time Series and Extended Kalman Filter
    作者: 陳俊宏
    Chen, Juhn-Horng
    貢獻者: 機械工程學系
    Mechanical Engineering
    關鍵詞: d-EWMA controller;deposition rate;extended Kalman filter;time series model;time-varying d-EWMA controller
    d-EWMA controller;deposition rate;extended Kalman filter;time series model;time-varying d-EWMA controller
    日期: 2007
    上傳時間: 2014-06-27 02:59:29 (UTC+8)
    摘要: By the time series model, this paper constructed the disturbance model for the aluminum sputter deposition process and derived the extending Kalman filter (EKF) controller based on this new disturbance model. Experimental results reveal that ARI(3,1) mode
    By the time series model, this paper constructed the disturbance model for the aluminum sputter deposition process and derived the extending Kalman filter (EKF) controller based on this new disturbance model. Experimental results reveal that ARI(3,1) mode
    顯示於類別:[機械工程學系] 期刊論文

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