Run by Run Process Control of Metal Sputter Deposition: Combining Time Series and Extended Kalman Filter

Chung-Hua University Repository > 工學院 > 機械工程學系 > 期刊論文 > Item 987654321/34666

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://chur.chu.edu.tw/handle/987654321/34666

题名:	Run by Run Process Control of Metal Sputter Deposition: Combining Time Series and Extended Kalman Filter
作者:	陳俊宏 Chen, Juhn-Horng
贡献者:	機械工程學系 Mechanical Engineering
关键词:	d-EWMA controller;deposition rate;extended Kalman filter;time series model;time-varying d-EWMA controller d-EWMA controller;deposition rate;extended Kalman filter;time series model;time-varying d-EWMA controller
日期:	2007
上传时间:	2014-06-27 02:59:29 (UTC+8)
摘要:	By the time series model, this paper constructed the disturbance model for the aluminum sputter deposition process and derived the extending Kalman filter (EKF) controller based on this new disturbance model. Experimental results reveal that ARI(3,1) mode By the time series model, this paper constructed the disturbance model for the aluminum sputter deposition process and derived the extending Kalman filter (EKF) controller based on this new disturbance model. Experimental results reveal that ARI(3,1) mode
显示于类别:	[機械工程學系] 期刊論文

文件中的档案:

档案	描述	大小	格式	浏览次数
p_m211_0237.pdf		27Kb	Adobe PDF	115	检视/开启

在CHUR中所有的数据项都受到原著作权保护.