Chung-Hua University Repository:Item 987654321/34666
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    Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/34666


    Title: Run by Run Process Control of Metal Sputter Deposition: Combining Time Series and Extended Kalman Filter
    Authors: 陳俊宏
    Chen, Juhn-Horng
    Contributors: 機械工程學系
    Mechanical Engineering
    Keywords: d-EWMA controller;deposition rate;extended Kalman filter;time series model;time-varying d-EWMA controller
    d-EWMA controller;deposition rate;extended Kalman filter;time series model;time-varying d-EWMA controller
    Date: 2007
    Issue Date: 2014-06-27 02:59:29 (UTC+8)
    Abstract: By the time series model, this paper constructed the disturbance model for the aluminum sputter deposition process and derived the extending Kalman filter (EKF) controller based on this new disturbance model. Experimental results reveal that ARI(3,1) mode
    By the time series model, this paper constructed the disturbance model for the aluminum sputter deposition process and derived the extending Kalman filter (EKF) controller based on this new disturbance model. Experimental results reveal that ARI(3,1) mode
    Appears in Collections:[Department of Mechanical Engineering] Journal Articles

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