Chung-Hua University Repository:Item 987654321/37473
English  |  正體中文  |  简体中文  |  Items with full text/Total items : 8557/14866 (58%)
Visitors : 1404285      Online Users : 1860
RC Version 6.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/37473


    Title: Impact of hydrogen dilution on optical properties of intrinsic hydrogenated amorphous silicon films prepared by high density plasma chemical vapor deposition for solar cell applications
    Authors: 賴瓊惠
    Lai, Chiung-Hui
    Contributors: 電子工程學系
    Electronics Engineering
    Keywords: high density plasma chemical vapor deposition;hydrogenated amorphous silicon;thin film solar cell
    Date: 2013
    Issue Date: 2014-07-01 10:29:07 (UTC+8)
    Abstract: P-i-n single-junction hydrogenated amorphous silicon (a-Si:H) thin film solar cells were successfully fabricated in this study on a glass substrate by high density plasma chemical vapor deposition (HDP-CVD) at low power of 50 W, low
    temperature of 200°C a
    Appears in Collections:[Department of Microelectronics] Journal Articles

    Files in This Item:

    File Description SizeFormat
    p_i403_0090.pdf27KbAdobe PDF223View/Open


    All items in CHUR are protected by copyright, with all rights reserved.


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback