Abstract --- 本研究是於玻璃基板上進行非晶矽薄膜太陽能電池製程設計，利用離子植入機、電子鎗蒸鍍機、PECVD以及曝光機等，在低鈉玻璃上，製作ITO透明導電膜、鋁電極及P/N junction等。並以CW 532nm雷射對各薄膜進行退火再結晶製程，以提昇在玻璃基板上製作非晶矽太陽能電池的效率。 This research was to make amorphous silicon solar cell on glass substrate. In order to raise the performance a continuous wave Nd: YAG laser (CW 532nm) was applied to anneal the amorphous thin film of silicon. The ion-implanter was also applied to make p-
