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    Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/32089


    Title: The Sub-Micron Hole Array in Sapphire Produced by Inductively-Coupled Plasma Reactive Ion Etching
    Authors: 馬廣仁
    Ma, Kung-Jen
    Contributors: 工程科學博士學位學程
    Ph.D. Program in Engineering Science
    Keywords: Al2O3;Sub-Micron Hole Array;ICP-RIE;Polystyrene Nanosphere
    Date: 2012
    Issue Date: 2014-06-27 01:44:06 (UTC+8)
    Abstract: The sub-micron hole array in a sapphire substrate was fabricated by using nanosphere lithography
    (NSL) combined with inductively-coupled-plasma reactive ion etching (ICP-RIE) technique.
    Polystyrene nanospheres of about 600 nm diameter were self-assembled
    Appears in Collections:[Ph.D.Program in Engineering Science] Journal Articles

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