Characterization of Rapid Thermal and Micro-wave Annealed Germanium Thin Films Grown by E-beam Evaporation on Glass Substrates

CHUR > College of Engineering > Department of Microelectronics > Journal Articles > Item 987654321/37480

Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/37480

Title:	Characterization of Rapid Thermal and Micro-wave Annealed Germanium Thin Films Grown by E-beam Evaporation on Glass Substrates
Authors:	賴瓊惠 Lai, Chiung-Hui
Contributors:	電子工程學系 Electronics Engineering
Keywords:	微波退火 Micro-wave Annealed
Date:	2013
Issue Date:	2014-07-01 10:29:20 (UTC+8)
Abstract:	In this paper, we used the electron beam (e-beam) evaporation to deposit Ge thin film on glass, and used microwave annealing (MWA) system of 5.8 GHz frequency for thin film crystallization. Then, we compared the MWA experiment results of sample sheet resi
Appears in Collections:	[Department of Microelectronics] Journal Articles

Files in This Item:

File	Description	Size	Format
p_i403_0091.pdf		26Kb	Adobe PDF	314	View/Open