Appication of advanced process control on mixed-product chemical mechanical polishing process

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Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/35004

Title:	Appication of advanced process control on mixed-product chemical mechanical polishing process
Authors:	陳俊宏 Chen, Juhn-Horng
Contributors:	機械工程學系 Mechanical Engineering
Keywords:	mix-product;chemical mechanical polishing;analysis of variance;time series analysis;extended Kalman filter
Date:	2011
Issue Date:	2014-06-27 03:17:04 (UTC+8)
Abstract:	This research developed a run-to-run (RtR) process control technique on the mix-product chemical mechanical polishing (CMP) process. The model of the mix-product CMP process was constructed by using analysis of variance and time series analysis. Then, it
Appears in Collections:	[Department of Mechanical Engineering] Seminar papers

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