Advanced Process Control of Metal Sputter Deposition Using Time Series Analysis

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题名:	Advanced Process Control of Metal Sputter Deposition Using Time Series Analysis
作者:	陳俊宏 Chen, Juhn-Horng
贡献者:	機械工程學系 Mechanical Engineering
关键词:	Time series model;Deposition rate;d-EWMA controller Time series model;Deposition rate;d-EWMA controller
日期:	2006
上传时间:	2014-06-27 03:00:07 (UTC+8)
摘要:	Using a time series model, we constructed a disturbance model for the aluminum sputter deposition process, and derived an autoregressive integrated moving average and recursive least-squares (ARIMA-RLS) controller based on this new disturbance model. Expe Using a time series model, we constructed a disturbance model for the aluminum sputter deposition process, and derived an autoregressive integrated moving average and recursive least-squares (ARIMA-RLS) controller based on this new disturbance model. Expe
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