Advanced Process Control of the Critical Dimension in Photolithography

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Title:	Advanced Process Control of the Critical Dimension in Photolithography
Authors:	陳俊宏 Chen, Juhn-Horng
Contributors:	機械工程學系 Mechanical Engineering
Keywords:	Run-to-run;R2R;controller;Nonlinear multiple exponential-weight moving-average controller;Dynamic model-tuning minimum-variance;DMTMV;controller;Photolithography process Run-to-run;R2R;controller;Nonlinear multiple exponential-weight moving-average controller;Dynamic model-tuning minimum-variance;DMTMV;controller;Photolithography process
Date:	2008
Issue Date:	2014-06-27 02:55:44 (UTC+8)
Abstract:	This paper describes two run-to-run controllers, a nonlinear multiple exponential-weight moving-average (NMEWMA) controller and a dynamic model-tuning minimum-variance (DMTMV) controller, for photolithography processes. The relationships between the input This paper describes two run-to-run controllers, a nonlinear multiple exponential-weight moving-average (NMEWMA) controller and a dynamic model-tuning minimum-variance (DMTMV) controller, for photolithography processes. The relationships between the input
Appears in Collections:	[Department of Mechanical Engineering] Journal Articles

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