The High-Speed Measurement of a Partial Area Imaging System Applied to Photoresist Development Processing

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题名:	The High-Speed Measurement of a Partial Area Imaging System Applied to Photoresist Development Processing
作者:	邱奕契 Chiou, Yih-Chih
贡献者:	機械工程學系 Mechanical Engineering
关键词:	Photolithography;exposure and development time;high speed image inspection system Photolithography;exposure and development time;high speed image inspection system
日期:	2005
上传时间:	2014-06-27 02:37:09 (UTC+8)
摘要:	Among the parameters that affect photolithography,the most important are exposure and development time which affect the coating photoresist characteristics.This study further researches the relationship between the exposure and development time using a hi Among the parameters that affect photolithography,the most important are exposure and development time which affect the coating photoresist characteristics.This study further researches the relationship between the exposure and development time using a hi
显示于类别:	[機械工程學系] 期刊論文

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