Chung-Hua University Repository:Item 987654321/33815
English  |  正體中文  |  简体中文  |  Items with full text/Total items : 8557/14866 (58%)
Visitors : 1403691      Online Users : 2533
RC Version 6.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: http://chur.chu.edu.tw/handle/987654321/33815


    Title: Oxidation and structure scheme studies for sensitivity improvement of Si1−xGex nanowire biosensor
    Authors: 賴瓊惠
    Lai, Chiung-Hui
    Contributors: 電子工程學系
    Electronics Engineering
    Keywords: 矽鍺;鍺濃縮;奈米線;生物感測器
    SiGe;Ge-condendation;Nanowire;Bisosensor
    Date: 2012
    Issue Date: 2014-06-27 02:31:10 (UTC+8)
    Abstract: 大的表面體積比可以提高感測器的靈敏度,最佳化的矽/矽鍺堆疊比例可以增加靈敏度.
    Because of the large surface-to-volume ratio of
    nano-structure, the silicon nanowires (SiNWs) provide a
    high sensitivity for highly sensitive detection of biological
    and chemical species. Moreover, the SiGe-on-Insulator
    (SGOI) by Ge-condensation process c
    Appears in Collections:[Department of Microelectronics] Seminar Papers

    Files in This Item:

    File Description SizeFormat
    OxidationandstructureschemestudiesforsensitivityimprovementofSi1−xGexnanowirebio.pdf25KbAdobe PDF186View/Open


    All items in CHUR are protected by copyright, with all rights reserved.


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback