PECVD Silicon Intrinsic Layer Deposition on Glass Substrate for
Solar Cell Design

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題名:	PECVD Silicon Intrinsic Layer Deposition on Glass Substrate for Solar Cell Design
作者:	林君明 Lin, Jium-Ming
貢獻者:	通訊工程學系 Communication Engineering
關鍵詞:	PECVD PECVD
日期:	2010
上傳時間:	2014-06-27 02:05:37 (UTC+8)
摘要:	This research is to deposit silicon thin film as the intrinsic layer of solar cell by PECVD on glass substrate with transparent conductive layer for solar cell intrinsic layer design. The method is to deposit transparent conductive layer ZnO and silver el This research is to deposit silicon thin film as the intrinsic layer of solar cell by PECVD on glass substrate with transparent conductive layer for solar cell intrinsic layer design. The method is to deposit transparent conductive layer ZnO and silver el
顯示於類別:	[通訊工程學系] 研討會論文

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