透過曝光機一致性(SMM)自動即時回饋系統改善曝光機之堆疊誤差

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Title:	透過曝光機一致性(SMM)自動即時回饋系統改善曝光機之堆疊誤差
Authors:	林君明 Lin, Jium-Ming
Contributors:	通訊工程學系 Communication Engineering
Keywords:	Match;Overlay;Residual;Matching Matrix Match;Overlay;Residual;Matching Matrix
Date:	2009
Issue Date:	2014-06-27 02:05:35 (UTC+8)
Abstract:	本研究是主要是討論利用高階補償改善各曝光機之一致性(Improve Scanner Matching)，使用於半導體黃光製程生產機台，凿括光罩製作、標準校正晶片製作、黃光生產機台曝光機(Scanner)曝光程式之建立模式、堆疊對準(Overlay)量測機台量測程式之建立，分析黃光生產機台曝光機機台與機台間之一致性(Match)誤差量，提升產能利用率與產品之良率改善(Yield Improve)。利用現代化半導體無塵室，所擁有的資源與設備，搭配現有黃光製程設備之基礎，設計發展一套改善機台間之誤差的系統，以因 This study is mainly focus on High-order compensation methods on matching result improvement by Lithography Exposure Scanner used on Semiconductor Lithography process, and those includes mask manufacturing, calibration reticle manufacturing, exposure reci
Appears in Collections:	[Department of Communication Engineering] Seminar papers

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