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類別	日期	題名	作者
[電子工程學系] 研討會論文	2009	Trap Profile and Bias Temperature Instability of ALD-HfSiON Gate Stacks in Advanced MOSFETs	吳建宏; rossiwu
[電子工程學系] 期刊論文	2012	The effect of thermal annealing on the properties of IGZO TFT prepared by atmospheric pressure plasma jet	吳建宏; rossiwu
[電子工程學系] 期刊論文	2012	The effect of oxgen species on the ZnO TFT prepared by atmosphere pressure plasma jet	吳建宏; rossiwu
[電子工程學系] 期刊論文	2013	Performance tuning of InGaZnO thin-film transistors with a SnInGaZnO electron barrier layer	吳建宏; rossiwu
[電子工程學系] 期刊論文	2011	Nickel Nanocrystals Embedded in Metal–Alumina–Nitride–Oxide–Silicon Type Low-Temperature Polycrystalline-Silicon Thin-Film Transistor for Low-Voltage Nonvolatile Memory Application	吳建宏; rossiwu
[電子工程學系] 研討會論文	2010	Nickel Nanocrystals embedded in MANOS Low Temperature Poly-Silicon Thin Film Transistor with Low Programming/Erasing Voltage for Non-Volatile Memory Application	吳建宏; rossiwu
[電子工程學系] 期刊論文	2010	Low Driving Voltage Amorphous In-Ga-Zn-O Thin Film Transistors with Small Subthreshold Swing Using High-κ Hf-Si-O Dielectrics	吳建宏; rossiwu
[電子工程學系] 研討會論文	2009	Limiting Factors of RF Performance Improvement as Down-scaling to 65-nm Node MOSFETs	吳建宏; rossiwu
[電子工程學系] 期刊論文	2011	Iridium Nanocrystal Thin-Film Transistor Nonvolatile Memory with Si3N4/SiO2 Stack of Asymmetric Tunnel Barrier	吳建宏; rossiwu
[電子工程學系] 研討會論文	2010	Iridium Nanocrystal Thin-Film Transistor Nonvolatile Memory with Asymmetric Tunnel Barrier	吳建宏; rossiwu
[電子工程學系] 期刊論文	2012	Improvement on Interface Quality and Reliability Properties of HfAlOx MIS Capacitor with Dual Plasma Treatment	吳建宏; rossiwu
[電子工程學系] 研討會論文	2011	Impact of Zirconia addition for ALD Hafina in HKMG Device Fabricated GF vs. GL	吳建宏; rossiwu
[電子工程學系] 研討會論文	2009	High Performance ZnO Thin-Film Transistors Using High-k TiHfO Gate Dielectrics	吳建宏; rossiwu
[電子工程學系] 研討會論文	2011	High Performance and Low Driving Voltage Amorphous InGaZnO Thin-Film Transistors Using High-K HfSiO Dielectrics	吳建宏; rossiwu
[電子工程學系] 研討會論文	2012	High Current Driving of SnO2 Channel Thin Film Transistor Using HfO2/ZrO2 High-k Gate Dielectrics	吳建宏; rossiwu
[電子工程學系] 期刊論文	2010	Gate-First TaN/La2O3/SiO2/Ge n-MOSFETs Using Laser Annealing	吳建宏; rossiwu
[電子工程學系] 期刊論文	2011	Formation of inverted-pyramid structure by modifying laser processing parameters and acid etching time	吳建宏; rossiwu
[電子工程學系] 研討會論文	2011	Flatband Voltage Tuning and EOT Reduction for Si02IHf02/TiN Gate Stacks via Lanthanum Oxide Capping Layers using Two Different Lanthanum Precursors	吳建宏; rossiwu
[電子工程學系] 期刊論文	2012	Electrical Improvement of MIS Capacitor with HfAlOx Gate Dielectrics Treated by Dual Plasma Treatment	吳建宏; rossiwu
[電子工程學系] 期刊論文	2011	Effects of La2O3 capping layers prepared by different ALD Lanthanum Precursors on Flatband Voltage Tuning and EOT scaling in TiN/HfO2/SiO2/Si MOS structures	吳建宏; rossiwu
[電子工程學系] 研討會論文	2009	Design of Low Noise, High Gain and Small Area 0.18um CMOS UWB LNA using New RC-Feedback Topology	吳建宏; rossiwu
[電子工程學系] 期刊論文	2009	Defect Density Extraction of high-κ Dielectric Gate Stack by Combining Charge Pumping and Low Frequency Measurement	吳建宏; rossiwu
[電子工程學系] 研討會論文	2012	Confined Resistive Switching of TiO2 Dielectrics Resistive Random Access Memory with a nanopore in the TiO2 film created by Focus Ion Beam	吳建宏; rossiwu
[電子工程學系] 期刊論文	2012	Characterization of Hf1-xZrxO2 Gate Dielectrics with 0 <= x <= 1 Prepared by Atomic Layer Deposition for Metal Oxide Semiconductor Field Effect Transistor Applications	吳建宏; rossiwu
[電子工程學系] 期刊論文	2012	Characteristics of IGZO TFT Prepared by Atmospheric Pressure Plasma Jet Using PE-ALD Al2O3 Gate Dielectric	吳建宏; rossiwu
[電子工程學系] 研討會論文	2009	A Wideband 0.18um CMOS LNA with RF-Feedback Topology for UWB Application	吳建宏; rossiwu

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